| Photomask Fabrication Technology Contributor(s): Eynon, Benjamin G. (Author), Wu, Banqiu (Author) |
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ISBN: 0071445633 ISBN-13: 9780071445634 Publisher: McGraw-Hill Companies OUR PRICE: $164.35 Product Type: Hardcover - Other Formats Published: August 2005 Annotation: Fabrication processing methods Quality control parameters Resolution enhancement techniques Defect reduction Photomask fabrication technologies and applications A must-have guide for engineers developing photomask manufacturing processes, "Photomask Fabrication Technology" fully explains the technology behind industrial photomask production, focusing on practical applications. Readers will find complete details on fundamental principles, industrial production flows, technological evolution and development, and state-of-the-art advancements. Includes detailed coverage of: Data preparation methods and issues Pattern formation and transfer technology Metrology and finishing methods Resolution enhancement applications Next-generation lithography trends Gain the expertise required for modern photomask manufacturing with this definitive resource: |
| Additional Information |
| BISAC Categories: - Technology & Engineering | Manufacturing - Technology & Engineering | Electronics - Microelectronics - Technology & Engineering | Telecommunications |
| Dewey: 621.381 |
| LCCN: 2005047886 |
| Series: Professional Engineering |
| Physical Information: 1.75" H x 6.16" W x 9.28" (2.03 lbs) 500 pages |
| Descriptions, Reviews, Etc. |
| Publisher Description: Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product. Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool's source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book. This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes |
Contributor Bio(s): Eynon, Benjamin G.: - Benjamin G. Eynon, Jr., is Senior Director of Product Marketing at KLA-Tencor Corporation. He has more than 18 years of experience in wafer and photomask industry technology. Banqiu Wu, Ph.D. is a Senior Staff Scientist at Photronics, Inc. He has expert-level photomask fabrication experience in the pattern transfer process.Wu, Banqiu: - Dr. Banqiu Wu (Austin, TX) is currently a Staff Scientist with Photronics, Inc. He has expert level hands-on photomask fabrication experience in the pattern transfer process. He holds several patents, over 30 technological publications, and several awards. Before coming to the US, he was an associate professor in Harbin Institute of Technology, Harbin, China. |