| Plasma Etching: An Introduction Contributor(s): Manos, Dennis M. (Editor), Flamm, Daniel L. (Editor) |
|
 |
ISBN: 0124693709 ISBN-13: 9780124693708 Publisher: Academic Press OUR PRICE: $72.22 Product Type: Hardcover - Other Formats Published: July 1989 Annotation: Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods. |
| Additional Information |
| BISAC Categories: - Technology & Engineering | Industrial Technology - Science | Chemistry - Physical & Theoretical - Technology & Engineering | Engineering (general) |
| Dewey: 621.044 |
| LCCN: 87037419 |
| Series: Plasma -- Materials Interactions |
| Physical Information: 1.43" H x 6.28" W x 9.26" (2.12 lbs) 476 pages |