| Physical Design and Mask Synthesis for Directed Self-Assembly Lithography 2018 Edition Contributor(s): Shim, Seongbo (Author), Shin, Youngsoo (Author) |
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ISBN: 3319762931 ISBN-13: 9783319762937 Publisher: Springer OUR PRICE: $104.49 Product Type: Hardcover - Other Formats Published: April 2018 |
| Additional Information |
| BISAC Categories: - Technology & Engineering | Nanotechnology & Mems - Technology & Engineering | Materials Science - Electronic Materials - Science | Nanoscience |
| Dewey: 537.622 |
| Series: Nanoscience and Technology |
| Physical Information: 0.44" H x 6.14" W x 9.21" (0.87 lbs) 138 pages |
| Descriptions, Reviews, Etc. |
| Publisher Description: This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. |