Silicon Micromachining Revised Edition Contributor(s): Elwenspoek, M. (Author), Jansen, H. V. (Author) |
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ISBN: 0521607671 ISBN-13: 9780521607674 Publisher: Cambridge University Press OUR PRICE: $79.79 Product Type: Paperback - Other Formats Published: August 2004 Annotation: This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon. Recent advances in these techniques have made it possible to create a new generation of microsystem devices, such as microsensors, accelerometers, micropumps, and miniature robots. The authors underpin the discussion of each technique with a brief review of the fundamental physical and chemical principles involved. They pay particular attention to methods such as isotropic and anisotropic wet chemical etching, wafer bonding, reactive ion etching, and surface micromachining. There is a special section on bulk micromachining, and the authors also discuss release mechanisms for movable microstructures. The book is a blend of detailed experimental and theoretical material, and will be of great interest to graduate students and researchers in electrical engineering and materials science whose work involves the study of micro-electromechanical systems (MEMS). |
Additional Information |
BISAC Categories: - Technology & Engineering | Electrical - Technology & Engineering | Materials Science - General - Technology & Engineering | Electronics - Optoelectronics |
Dewey: 621.381 |
Series: Cambridge Studies in Semiconductor Physics and Microelectron |
Physical Information: 0.91" H x 7.38" W x 9.62" (1.67 lbs) 420 pages |