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Plasma-Surface Interactions and Processing of Materials 1990 Edition
Contributor(s): Auciello, O. (Editor), Gras-Martí, Alberto (Editor), Valles-Abarca, Jose Antonio (Editor)
ISBN: 0792305841     ISBN-13: 9780792305842
Publisher: Springer
OUR PRICE:   $313.49  
Product Type: Hardcover - Other Formats
Published: January 1990
Qty:
Annotation: An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
Additional Information
BISAC Categories:
- Technology & Engineering | Nanotechnology & Mems
- Technology & Engineering | Materials Science - General
- Science | Chemistry - Physical & Theoretical
Dewey: 620.44
LCCN: 89048126
Series: International Archives of the History of Ideas
Physical Information: 1.25" H x 6.14" W x 9.21" (2.15 lbs) 558 pages
 
Descriptions, Reviews, Etc.
Publisher Description:
An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space.
The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials.
The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.