Limit this search to....

Nanolithography: A Borderland Between Stm, Eb, Ib, and X-Ray Lithographies 1994 Edition
Contributor(s): Gentili, M. (Editor), Giovannella, Carlo (Editor), Selci, Stefano (Editor)
ISBN: 0792327942     ISBN-13: 9780792327943
Publisher: Springer
OUR PRICE:   $208.99  
Product Type: Hardcover - Other Formats
Published: April 1994
Qty:
Annotation: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Additional Information
BISAC Categories:
- Technology & Engineering | Materials Science - Thin Films, Surfaces & Interfaces
- Technology & Engineering | Electrical
- Technology & Engineering | Electronics - Circuits - General
Dewey: 621.381
LCCN: 94010205
Series: Astrophysics and Space Science Library
Physical Information: 0.56" H x 6.14" W x 9.21" (1.11 lbs) 216 pages
 
Descriptions, Reviews, Etc.
Publisher Description:
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).