Nanolithography: A Borderland Between Stm, Eb, Ib, and X-Ray Lithographies 1994 Edition Contributor(s): Gentili, M. (Editor), Giovannella, Carlo (Editor), Selci, Stefano (Editor) |
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ISBN: 0792327942 ISBN-13: 9780792327943 Publisher: Springer OUR PRICE: $208.99 Product Type: Hardcover - Other Formats Published: April 1994 Annotation: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL). |
Additional Information |
BISAC Categories: - Technology & Engineering | Materials Science - Thin Films, Surfaces & Interfaces - Technology & Engineering | Electrical - Technology & Engineering | Electronics - Circuits - General |
Dewey: 621.381 |
LCCN: 94010205 |
Series: Astrophysics and Space Science Library |
Physical Information: 0.56" H x 6.14" W x 9.21" (1.11 lbs) 216 pages |
Descriptions, Reviews, Etc. |
Publisher Description: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL). |