| Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications Contributor(s): Attwood, David (Author) |
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ISBN: 1139164422 ISBN-13: 9781139164429 Publisher: Cambridge University Press OUR PRICE: $213.75 Product Type: Open Ebook - Other Formats Published: June 2012 |
| Additional Information |
| BISAC Categories: - Technology & Engineering | Electronics - Optoelectronics |
| Dewey: 539.722 |
| Physical Information: 1 pages |
| Descriptions, Reviews, Etc. |
| Publisher Description: This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science. |