| Ferroelectric Dielectrics Integrated on Silicon Contributor(s): Defaÿ, Emmanuel (Editor) |
|
 |
ISBN: 1848213131 ISBN-13: 9781848213135 Publisher: Wiley-Iste OUR PRICE: $233.65 Product Type: Hardcover - Other Formats Published: October 2011 |
| Additional Information |
| BISAC Categories: - Technology & Engineering | Electronics - Semiconductors |
| Dewey: 621.381 |
| LCCN: 2011035048 |
| Physical Information: 1.1" H x 6.2" W x 9.2" (1.75 lbs) 448 pages |
| Descriptions, Reviews, Etc. |
| Publisher Description: This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies. After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterization. An in-depth study of the influence of leakage currents is performed together with reliability discussion. Three applicative chapters cover integrated capacitors, variables capacitors and ferroelectric memories. The final chapter deals with a reasonably new research field, multiferroic thin films. |
