| Progress in Nano-Electro Optics III: Industrial Applications and Dynamics of the Nano-Optical System 2005 Edition Contributor(s): Ohtsu, Motoichi (Editor) |
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ISBN: 3540210504 ISBN-13: 9783540210504 Publisher: Springer OUR PRICE: $161.49 Product Type: Hardcover - Other Formats Published: October 2004 |
| Additional Information |
| BISAC Categories: - Science | Physics - Optics & Light - Technology & Engineering | Optics - Technology & Engineering | Electronics - General |
| Dewey: 621.381 |
| LCCN: 2002030321 |
| Series: Springer Series in Optical Sciences |
| Physical Information: 0.7" H x 6.3" W x 9.2" (1.10 lbs) 224 pages |
| Descriptions, Reviews, Etc. |
| Publisher Description: Near-?eld optical recording is a promising way to realize a recording density 2 of over 1 Tb/in . In this chapter, we focused on the near-?eld optical head, which is a key device for near-?eld optical recording. First, we explained the technical issues regarding the near-?eld optical head and introduced some solutions to these issues. We focused on a highly e?cient near-?eld optical head that uses a wedge-shaped metallic plate, and described its optical pr- erties based on a simulation using a ?nite-di?erence time-domain method. The simulation results con?rmed that a strong optical near ?eld is generated at the apex of the metallic plate when a plasmon is excited in the metallic plate. When a TbFeCo recording medium was placed 10 nm from the ne- ?eld optical head, the size of the optical spot was 30 nm, which corresponds 2 to an areal recording density of approximately 1 Tb/in . The e?ciency was 20% if we assume that the incident beam was a Gaussian beam with a full width at half-maximum of 1 m. Furthermore, we discussed an optical head using two metallic plates. We con?rmed through our simulation that a highly localized optical near ?eld was generated at the gap when the plasmon was excited in the metallic plates. The distribution was 5 nm by 5 nm when the two apices were separated by 5 nm. |