| Nanolithography: A Borderland Between Stm, Eb, Ib, and X-Ray Lithographies Contributor(s): Gentili, M. (Editor), Giovannella, Carlo (Editor), Selci, Stefano (Editor) |
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ISBN: 9048143888 ISBN-13: 9789048143887 Publisher: Springer OUR PRICE: $208.99 Product Type: Paperback - Other Formats Published: December 2010 |
| Additional Information |
| BISAC Categories: - Technology & Engineering | Materials Science - Thin Films, Surfaces & Interfaces - Technology & Engineering | Electrical - Technology & Engineering | Electronics - Circuits - General |
| Dewey: 621.381 |
| Series: NATO Science Series E: (Closed) |
| Physical Information: 0.48" H x 6.14" W x 9.21" (0.72 lbs) 216 pages |
| Descriptions, Reviews, Etc. |
| Publisher Description: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL). |
