| Advances in Rapid Thermal and Integrated Processing Contributor(s): Roozeboom, F. (Editor) |
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ISBN: 9048146968 ISBN-13: 9789048146963 Publisher: Springer OUR PRICE: $427.49 Product Type: Paperback - Other Formats Published: December 2010 |
| Additional Information |
| BISAC Categories: - Science | Physics - Condensed Matter - Science | Spectroscopy & Spectrum Analysis - Technology & Engineering | Optics |
| Dewey: 621.381 |
| Series: NATO Science Series E: |
| Physical Information: 1.17" H x 6.14" W x 9.21" (1.77 lbs) 566 pages |
| Descriptions, Reviews, Etc. |
| Publisher Description: Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage. |