| Crystal Growth for Beginners: Fundamentals of Nucleation, Crystal Growth and Epitaxy (2nd Edition) Revised Edition Contributor(s): Markov, Ivan Vesselinov (Author) |
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ISBN: 9812382453 ISBN-13: 9789812382450 Publisher: World Scientific Publishing Company OUR PRICE: $153.90 Product Type: Hardcover Published: August 2003 Annotation: This is the first-ever textbook on the fundamentals of nucleation, crystal growth and epitaxy. It has been written from a unified point of view and is thus a non-electic presentation of this interdisciplinary topic in materials science. The reader is required to possess some basic knowledge of mathematics and physics. All formulate and equations are accompanied by examples that are of technological importance. The book presents not only the fundamentals but also the state of the art in the subject. Thus, it serves as a valuable reference book for both graduate students and researchers in materials science. Contents: Crystal--Ambient Phase Equilibrium; Nucleation: Crystal Growth: Epitaxial Growth. Readership: Graduate students, academics and researchers in materials engineering, microelectronics, new materials, semiconductors and related areas. |
| Additional Information |
| BISAC Categories: - Science | Physics - Crystallography |
| Dewey: 548.5 |
| LCCN: 2002044923 |
| Physical Information: 1.51" H x 6.02" W x 9.3" (1.89 lbs) 564 pages |
| Descriptions, Reviews, Etc. |
| Publisher Description: This is the first-ever textbook on the fundamentals of nucleation, crystal growth and epitaxy. It has been written from a unified point of view and is thus a non-eclectic presentation of this interdisciplinary topic in materials science. The reader is required to possess some basic knowledge of mathematics and physics. All formulae and equations are accompanied by examples that are of technological importance. The book presents not only the fundamentals but also the state of the art in the subject. The second revised edition includes two separate chapters dealing with the effect of the Ehrlich-Schwoebel barrier for down-step diffusion, as well as the effect of surface active species, on the morphology of the growing surfaces. In addition, many other chapters are updated accordingly. Thus, it serves as a valuable reference book for both graduate students and researchers in materials science. |