| Investigation on Sige Selective Epitaxy for Source and Drain Engineering in 22 NM CMOS Technology Node and Beyond 2019 Edition Contributor(s): Wang, Guilei (Author) |
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ISBN: 9811500452 ISBN-13: 9789811500459 Publisher: Springer OUR PRICE: $104.49 Product Type: Hardcover - Other Formats Published: October 2019 |
| Additional Information |
| BISAC Categories: - Technology & Engineering | Electronics - Semiconductors - Technology & Engineering | Nanotechnology & Mems - Science | Physics - Electricity |
| Dewey: 537.622 |
| Series: Springer Theses |
| Physical Information: 0.38" H x 6.14" W x 9.21" (0.80 lbs) 115 pages |