| Chemical Vapor Deposition: Principles and Applications Contributor(s): Hitchman, M. L. (Editor), Jensen, K. F. (Editor) |
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ISBN: 0123496705 ISBN-13: 9780123496706 Publisher: Academic Press OUR PRICE: $484.00 Product Type: Hardcover - Other Formats Published: April 1993 * Not available - Not in print at this time *Annotation: This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles. |
| Additional Information |
| BISAC Categories: - Technology & Engineering | Nanotechnology & Mems - Technology & Engineering | Chemical & Biochemical - Science | Chemistry - Industrial & Technical |
| Dewey: 620.44 |
| LCCN: 93125773 |
| Physical Information: 1.44" H x 6.14" W x 9.21" (2.49 lbs) 677 pages |